"RESIST 193-157"

EU, ESPRIT Project No. 33562.

     Στα πλαίσια του προγράμματος πραγματοποιήθηκαν οι εξής δημοσιεύσεις σε διεθνή περιοδικά με σύστημα κριτών:

[1] Characterization and simulation of surface and line-edge roughness in photoresists.

V. Costantoudis, E. Gogolides, G. Patsis, A. Tserepi, E. Valamontes.

J. Vac. Scien. & Technol. B, 19 (6), 2694, (2001).

[2] Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation.

G. Patsis, A. Tserepi, I.Raptis, N. Glezos, E. Gogolides and E. Valamontes.

J. Vac. Scien. & Technol. B 18 (6), 3292, (2000).

[3] Etching behaviour of Si-containing polymers as resist materials for bilayer lithography: The case of poly-dimethyl siloxane.

A. Tserepi, G. Cordoyiannis, G. Patsis, V. Costantoudis, E. Gogolides,E. Valamontes, D. Eon, M. Peignon, C. Cardinaud and G. Turban.

J. Vac. Sci. Techol. B 21(1), 174 -182 (2003).

[4] Surface and line-edge roughness in plasma developed resists.

A.Tserepi, E. Valamontes, E. Tegou, I.Raptis and E. Gogolides.

Microelectronic Engineering, Vol. 57-58, 547-554, 2001.

[5] Roughness characterization in positive and negative resists.

V. Costantoudis, E. Gogolides, A. Tserepi, C. D.  Diacoumakos, E. S. Valamontes.   

Microelectronic Engineering, Vol. 61-62, 793-801, (2002).